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Global Advanced Materials Leader Providing High Value-Added Solutions for Semiconductor Materials, KPX Electrochem

Chemical

Chemical

Semiconductor manufacturing is a high-tech industry that goes through hundreds of sophisticated processes to form microstructures.
Process Chemical used in this process is an essential material for determining core quality, including circuit pattern formation, metal wiring, surface cleaning, and contamination control.

Features of KPX Electrochem Chemical

  • High Purity/High Reliability/
    High Performance

    It meets the core requirements of the semiconductor manufacturing process and contributes to improving the yield of customers and securing process stability in the latest fine and highly integrated processes.

  • Response to Customer Needs

    Develop a chemical product with a customized composition for semiconductor device performance and quality needs that are highly integrated and refined by developing products that meet performance requirements such as peeling, etching, and cleaning.

  • Manufacturing Process
    Management

    We produce and supply wet chemical products that meet performance and quality needs by using high-purity raw materials and establishing a filtration system that meets the customer's eye level.

  • Simulating Customer Lines

    Our spin etcher delivers performance comparable to our customers’ equipment, enabling data-driven product recommendations based on reliable demo test results.

KPX Electrochem Chemical Product Line-up

Product Performance Remark
Stripper Posi. < 50㎛ thick PR stripper, Cu loss <0.5Å/min DMSO, NMP free
Nega. < 80㎛ thick PR stripper, Cu loss <15Å/min DMSO base
Nega.+Posi. < 350㎛ thick PR stripper, Cu loss <5Å/min DMSO base
Etchant Cu Cu etchant (UBM Cu) Acid base
Ti Ti etchant
(Bump Tii: one-component / two-component)		 Alkali base
TiW TiW etchant designed for RDL applications Alkali base
PCC
(Post CMP Cleaner)		 Cu Low Cu surface roughness /
Compatible with TEOS and Low-k dielectrics		 TMAH base / TMAH free
W Selective Alumina dissolution performance /
Compatible with Cu, W, Ti, Co		 TMAH free
PERR
(Post Etch Residue Remover)		 Cu Organic residue remove / TiN, AlN etch Alkali base
Organic residue remove / oxide etch Fluoride base